Raftul cu initiativa Book Archive

Chemistry

Handbook of Chemical Vapor Deposition, Second Edition : by Hugh O. Pierson

By Hugh O. Pierson

Flip to this new moment version for an realizing of the most recent advances within the chemical vapor deposition (CVD) method. CVD expertise has lately grown at a quick price, and the quantity and scope of its functions and their impression out there have elevated significantly. The industry is now expected to be at the least double that of an insignificant seven years in the past whilst the 1st variation of this booklet was once released. the second one variation is an replace with a significantly improved and revised scope. Plasma CVD and metallo-organic CVD are significant components during this fast progress. Readers will locate the newest info on either strategies during this quantity. Likewise, the ebook explains the becoming significance of CVD in construction of semiconductor and similar functions.

Show description

Read Online or Download Handbook of Chemical Vapor Deposition, Second Edition : Principles, Technologies and Applications (Materials Science and Process Technology Series) PDF

Similar chemistry books

Biological Chemistry of Organelle Formation

Eukaryotic cells comprise a plurality of organelles uncommon via their particular membranes and contents. Their biogenesis happens via progress and department of preexisting buildings instead of de novo. Mitochondria and chloroplasts, which seem to be descended from prokaryotic ancestors, have retained a few DNA and the biosynthetic strength for its expression.

Extra info for Handbook of Chemical Vapor Deposition, Second Edition : Principles, Technologies and Applications (Materials Science and Process Technology Series)

Sample text

Pp. 249– 276, John Wiley & Sons, New York (1966) 2. Sawyer, W. S. Pat. 229335 (June 29, 1880) on pyrolytic carbon; Aylsworth, J. S. Pat. 553296 (Jan. S. Pat. 575002 (Jan. 12, 1897) and 575668 (Jan. S. Pat. 455230 (June 30, 1891) on nickel deposition 3. S. Patent 2962388 4. Atl, L. , J. 0 INTRODUCTION Chemical vapor deposition is a synthesis process in which the chemical constituents react in the vapor phase near or on a heated substrate to form a solid deposit. The CVD technology combines several scientific and engineering disciplines including thermodynamics, plasma physics, kinetics, fluid dynamics, and of course chemistry.

0 PROFILE OF THE CVD BUSINESS The principal objective of this book is the study of the CVD technology. However, it is also important to consider this technology within the more general context of the CVD industry and a brief review of the industry is necessary in order to bring the technology into proper focus. S. and abroad, not only in industry but also in universities and in many of the major government laboratories. Government sponsorship in most countries remains an important factor either in terms of funding or as a research leader.

This will happen if the thermodynamics is favorable, that is if the transfer of energy—the freeenergy change of the reaction known as ∆Gr—is negative. To calculate ∆Gr, it is necessary to know the thermodynamic properties of each component, specifically their free energies of formation (also known as Gibbs free energy), ∆Gf. The relationship is expressed by the following equation: Eq. (1) ∆Gr °= Σ∆G f ° products − Σ∆G f ° reactants The free energy of formation is not a fixed value but varies as a function of several parameters which include the type of reactants, the molar ratio of these reactants, the process temperature, and the process pressure.

Download PDF sample

Rated 4.12 of 5 – based on 36 votes